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Simple General Purpose Ion Beam Deceleration System Using a Single Electrode Lens

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DOI: 10.4236/wjet.2015.33014    7,225 Downloads   7,759 Views   Citations
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ABSTRACT

Ion beam deceleration properties of a newly developed low-energy ion beam implantation system were studied. The objective of this system was to produce general purpose low-energy (5 to 15 keV) implantations with high current beam of hundreds of μA level, providing the most wide implantation area possible and allowing continuously magnetic scanning of the beam over the sample(s). This paper describes the developed system installed in the high-current ion implanter at the Laboratory of Accelerators and Radiation Technologies of the Nuclear and Technological Cam-pus, Sacavém, Portugal (CTN).

Conflicts of Interest

The authors declare no conflicts of interest.

Cite this paper

Lopes, J. and Rocha, J. (2015) Simple General Purpose Ion Beam Deceleration System Using a Single Electrode Lens. World Journal of Engineering and Technology, 3, 127-133. doi: 10.4236/wjet.2015.33014.

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