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Fukaya, T., Hara, S., Tanaka, Y., Matsumoto, S., Suzuki, T., Fuse, G., et al. (2008) Formation of Ultra-Shallow Junction with ~10 nm in Si Combined with Low Temperature and Laser Annealing. The 5th International Symposium on Advanced Science and Technology of Silicon Materials (JSPS Si Symposium), 10-14 November 2008, Kona, Hawaii.

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