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Fukaya, T., Hara, S., Tanaka, Y., Matsumoto, S., Suzuki, T., Fuse, G., et al. (2008) Formation of Ultra-Shallow Junction with ~10 nm in Si Combined with Low Temperature and Laser Annealing. The 5th International Symposium on Advanced Science and Technology of Silicon Materials (JSPS Si Symposium), 10-14 November 2008, Kona, Hawaii.
http://www.riam.kyushu-u.ac.jp/nano/hawaii2008/index.html
http://www.researchgate.net/publication/240632078_Formation_of_Ultra-shallow_Junction_with
_%2A10_nm_in_Si_Combined_with_Low_Temperature_and_Laser_Annealing

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