Scott, G.D., McLauchlan, T.A. and Sennett, R.S. (1950) The Thickness Measurement of Thin Films by Multiple Beam Interferometry. Journal of Applied Physics, 21, 843.
http://dx.doi.org/10.1063/1.1699770

has been cited by the following article:

• TITLE: Investigation on the Effect of Film Thickness on the Surface Morphology, Electrical and Optical Properties of E-Beam Deposited Indium Tin Oxide (ITO) Thin Film

  AUTHORS: Golam Saklayen, Shahinul Islam, Ferdous Rahman, Abu Bakar Ismail

  KEYWORDS: E-Beam Deposition, Surface Morphology, Thin Films, EDX, Atomic Force Microscopy, SEM, Annealing, Electrical and Optical Properties

  JOURNAL NAME: Advances in Materials Physics and Chemistry, Vol.4 No.10, October 23, 2014

  ABSTRACT: The following article has been retracted due to the fact that the authors practise fraud. The scientific community takes a very strong view on this matter, and the Advances in Materials Physics and Chemistry treats all unethical behavior seriously. This paper published in Vol. 4 No. 10 194-202, 2014 has been removed from this site. Title: Investigation on the Effect of Film Thickness on the Surface Morphology, Electrical and Optical Properties of E-Beam Deposited Indium Tin Oxide (ITO) Thin Film Authors: Golam Saklayen, Shahinul Islam, Ferdous Rahman, Abu Bakar Ismail