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Brissonneau, L. and Vahlas, C. (1999) MOCVD-Processed Ni Films from Nickelocene. Part I: Growth Rate and Morphology. Chemical Vapor Deposition, 5, 135-142.
http://dx.doi.org/10.1002/(SICI)1521-3862(199908)5:4<135::AID-CVDE135>3.0.CO;2-1

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