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L. Brissonneau and C. Vahlas, “MOCVD-Processed Ni Films from Nickelocene. Part I: Growth Rate and Morphology,” Chemical Vapor Deposition, Vo. 5, No. 4, 1999, pp. 135-142. doi:10.1002/(SICI)1521-3862(199908)5:4<135::AID-CVDE135>3.0.CO;2-1

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