The Investigation of Microstructure and the X-Ray Phase Analysis of Re-X Alloys (X = S, Se, Te)

E. A. Salakhova, D. B. Tagiyev, K. F. Ibrahimova, P. E. Kalantarova

Laboratory of Electrochemistry of Rhenium Alloys and Electrocatalysis, Institute of Catalysis and Inorganic Chemistry, NAS of Azerbaijan, Baku, Azerbaijan.

DOI: 10.4236/msce.2015.310001                

Abstract

Influence of terms electrolysis and concentration of electrolysis components on the microstructure obtaining films of the chalcogenides rhenium has been studied. Appearance and structure electrolytical depositions of chalcogenides rhenium, obtaining by electrochemical method, depend from electrolysis conditions. In the process of studying of electrolysis conditions has determinated that for obtaining qualitative depositions of rhenium chalcogenides most suitable temperature is 75℃- 80℃. Microscopic studying of surface of catholic deposition of Re-Se showed that on the cathode had been obtained dense fine-crystalline black coverings. More qualitative depositions have been obtained for low current density. Increasing if current density adducts to gradual deterioration of structure cathode depositions. It has been determinated that specific influence on the process of deposition Re-S alloys has changing of electrolyte pH and current density. At low pH values, the colloidal sulfur formed in electrolyte has adsorbed on the cathode and bearing to the deposits quality. Microscopic studying of surface of cathode depositions Re-Te₂ showed that on the cathode at current density 2 mA/sm² had been obtained dense grey fine crystalline deposits of ReTe₂.

Keywords

Electrochemistry, Rhenium Chalcogenides, Microstructure, Electrodeposition, Alloys Films

Conflicts of Interest

The authors declare no conflicts of interest.

References

[1]	Naor, E.N. (2010) Ammtiac Quarterly. Properties and Applications of Rhenium and Its Alloys, 5, 11-15.
[2]	Pallant, A.A. (2007) Monograph Metallurgy of Rhenium. Nauka, 298.
[3]	Speranskaya, Y.F. (1990) In Coll. Electrochemistry of Rhenium. Publishing House “Gylym”, Alma-Ata, 253.
[4]	Sagiv, M.C., Eliaz, N., et al. (2013) Incorporation of Iridium into Electrodeposited Rhenium-Nickel Alloys. Electrochimica Acta, 88, 240-250. http://dx.doi.org/10.1016/j.electacta.2012.10.094
[5]	Naor, A., Noam, E., et al. (2010) Electeodeposition of Alloys of Rhenium with Iron-Group Metals from Aqueous Solutions. Journal of the Electrochemical Society, 157, D422-D427. http://dx.doi.org/10.1149/1.3430084
[6]	Naor, A., Noam, E., et al. (2010) Direct Experimental Support for the Catalytic Effect of Iron-Group Metals on Electrodeposition of Rhenium. Electrochemical and Solid-State Letters, 13, D91-D93. http://dx.doi.org/10.1149/1.3489532
[7]	Salakhova, E.A. (2003) Electrochemical Production of Thin Films of System Rhenium-Selenium Alloys. The Journal “Inorganic Materials”, 39, 142-146.
[8]	Salakhova, E.A. and Majidzada, V.A. (2011) Electrochemical Preparation of Thin Rhenium-Tellurium Coatings Chloride-Borate Electrolyte. Russian Journal of Electrochemistry, 47, 877-882. http://dx.doi.org/10.1134/S1023193511080118
[9]	Salakhova, E.A., Aliyev, A.M. and Ibragimova, K.F. (2014) The Obtaining of Thin Films Re-S from Tiocarbamid Electrolytes and Influence gf Various Factors on the Alloys Composition. American Chemical Science Journal, 4, 338-348.
[10]	Salakhova, E.A. and Aliyev, A.M. (2012) Obtaining the Thin Semiconductive Covering Re-Se from Sulphate Electrolyte. Journal of Advanced in Materials and Physics Chemistry, 2, 253-255. http://dx.doi.org/10.4236/ampc.2012.24B064
[11]	Salakhova, E.A. (2008) Receiving Thin Films Re-Te from Chloride-Sulfate Electrolyte and the Influence of the Various Factors on Composition of Alloys. Chemical Industry Today, 6, 43-47.
[12]	Salakhova, E.A., Medjidzade, V.A., et al. (2013) The Electro-Physical Properties of Rhenium Chalcogenides’ Thin Films. Journal of Chemistry and Chemical Engineering, 7, 518-521.
[13]	Salakhova, E.A. (2014) The Electrochemical Deposition of Rhenium Chalcogenides from Different Electrolytes. Journal of Chemical Engineering and Chemistry Research, 1, 185-198.