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Onaya, T., Nabatame, T., Sawamoto, N., Ohi, A., Ikeda, N., Nagata, T. and Ogura, A. (2019) Improvement in Ferroelec-tricity of HfxZr1-xO2 Thin Films Using Top- and Bottom-ZrO2 Nucleation Layers. APL Materials, 7, Article ID: 061107.
https://doi.org/10.1063/1.5096626

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