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H. Liu, S. Jung, Y. Fukimura, C. Fukai, H. Shirai and Y. Toyoshima, “Low Temperature Plasma-Enhanced Chemical Vapor Deposition of Crystal Silicon Film from Dichlorosilane,” Japanese Journal of Applied Physics, Vol. 40, 2001, pp. 44-48. doi:10.1143/JJAP.40.44
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