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C. W. Ow-Yang, Y. Shigesato and D. C. Paine, “Interface Stability of an Indium Tin Oxide Thin Film Deposited on Si and Si0.85Ge0.15,” Journal of Applied Physics, Vol. 88, No. 6, 2000, pp. 3717-3724. doi:10.1063/1.1288694

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