Article citationsMore>>

W. Yang and C. A. Wolden, “Plasma-Enhanced Chemical Vapor Deposition of TiO2 Thin Films for Dielectric Applications,” Thin Solid Films, Vol. 515, No. 4, 2006, pp. 1708-1713.

has been cited by the following article:

Follow SCIRP
Twitter Facebook Linkedin Weibo
Contact us
+1 323-425-8868
WhatsApp +86 18163351462(WhatsApp)
Click here to send a message to me 1655362766
Paper Publishing WeChat
Free SCIRP Newsletters
Copyright © 2006-2024 Scientific Research Publishing Inc. All Rights Reserved.