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C. Martinet, V. Paillard, A. Gagnaire and J. Joseph, “Deposition of SiO2 and TiO2 Thin Films by Plasma Enhanced Chemical Vapor Deposition for Antireflection Coating,” Journal of Non-Crystalline Solids, Vol. 216, 1997, pp. 77-82.
http://dx.doi.org/10.1016/S0022-3093(97)00175-0

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