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H. Tanoue, M. Kamiya, S. Oke, Y. Suda, H. Takikawa, M. Taki, N. Tsuji, T. Ishikawa, H. Yasui, S. Temei and H. Takahashi, “Effect of Gas Introduction Position on Substrate Etching by Means of Ar-Dominated Graphite-Cathodic-Arc Plasma Beam in μT-FAD,” Thin Solid Films, Vol. 518, No. 13, 2010, pp. 3546-3550. doi:10.1016/j.tsf.2009.11.050

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