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G. G. Wang, H. Y. Zhang, H. F. Zhou, X. P. Kuang, Q. B. Wu, H. B. Zuo, J. C. Han and H. T. Ma, “Effect of ECR Assisted Microwave Plasma Nitriding Treatment on the Microstructure Characteristics of FCVA Deposited Ultra-Thin ta-C Films for High Density Magnetic Storage Application,” Applied Surface Science, Vol. 256, No. 10, 2010, pp. 3024-3030. doi:10.1016/j.apsusc.2009.11.067

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