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K. H. Ahna, et al., “Kinetic and Mechanistic Study on the Chemical Vapor Deposition of Titanium Dioxide Thin Films by in Situ FT-IR Using TTIP,” Surface and Coatings Technology, Vol. 171, No. 1-3, 2003, pp. 198-204. doi:10.1016/S0257-8972(03)00271-8

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