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N. Matsunami, S. Venkatachalam, M. Tazawa, H. Kakiuchida and M. Sataka, “Ion Beam Characterization of rfSputter Deposited AlN Films on Si(111),” Nuclear Instruments Methods B, Vol. 266, No. 8, 2008, pp. 15221526. doi:10.1016/j.nimb.2007.12.086

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