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S. A. Campbell, H. S. Kim, D. C. Gilmer, B. He, T. Ma and W. L. Gladfelter, “Titanium Dioxide (TiO2)-Based Gate Insulators,” IBM Journal of Research and Development, Vol. 43, No. 3, 1999, pp. 383-392. doi:10.1147/rd.433.0383

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