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H. Habuka, Y. Ando and M. Tsuji, “Room Temperature Process for Chemical Vapor Deposition of Silicon Carbide Thin Film Using Monomethylsilane Gas,” Surface and Coatings Technology, Vol. 206, No. 1, 2011, pp. 1503-1506. doi:10.1016/j.surfcoat.2011.09.037

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