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H. Habuka, T. Nagoya, M. Mayusumi, M. Katayama, M. Shimada and K. Okuyama, “Model on Transport Phenomena and Epitaxial Growth of Silicon Thin Film in SiHCl3-H2 System under Atmospheric Pressure,” Journal of Crystal Growth, Vol. 169, No. 1, 1996, pp. 61-72. doi:10.1016/0022-0248(96)00376-4

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