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K. Maeshige, G. Washio, T. Yagisawa and T. Makabe, “Functional Design of a Pulsed Two-Frequency Capacitively Coupled Plasma in CF4/Ar for SiO2 Etching,” Journal of Applied Physics, Vol. 91, No. 12, 2002, 8 p. doi:10.1063/1.1478138

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