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B. Radjenovic and M. Radmilovic, “3D Etching Profile Evolution Simulations: Time Dependence Analysis of the Profile Charging during SiO2 Etching in Plasma,” Journal of Physics: Conference Series, Vol. 86, No. 1, 2007, Article ID: 012017. doi:10.1088/1742-6596/86/1/012017

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