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K. V. Emtsev, A. Bostwick, K. Horn, J. Jobst, G. L. Kel- logg, L. Ley, J. L. McChesney, T. Ohta, S. A. Reshanov, J. R?hrl, E. Rotenberg, A. K. Schmid, D. Waldmann, H. B. Weber and T. Seyller, “Toward Wafer-Size Graphene Layers by Atmospheric Pressure Graphitization of Silicon Carbide,” Nature Materials, Vol. 8, No. 3, 2009, pp. 203- 207. doi:10.1038/nmat2382

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