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M. Goto, S. Kawanaka, S. Inumiya, N. Kusunoki, M. Saitoh, K. Tatsumura, A. Kinoshita, S. Inaba and Y. Toyoshima, “The Study of Mobility-Tin, Trade-Off in Deeply Scaled High-k/Metal Gate Devices and Scaling Design Guideline for 22 nm-Node Generation,” 2009 Symposium on VLSI Technology, Kyoto, 16-18 June 2009, pp. 214-215.

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