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R. Ikada, G. Nishimura, K. Kato and S. Iizuka, “Production of High Density and Low Electron-Temperature Plasma by a Modified Grid-Biasing Method Using Inductively Coupled RF Discharge,” Thin Solid Films, Vol. 457, No. 1, 2004, pp. 55-58. doi:10.1016/j.tsf.2003.12.013

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