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Iwai, H., Ohmi, S., Akama, S., Ohshima, C., Kikuchi, A., Kashiwagi, I., Taguchi, J., Yamamoto, H., Tonotani, J., Kim, Y., Ueda, I., Kuriyama, A. and Yoshihara, Y. (2002) Advanced Gate Dielectric Materials for Sub-100 nm CMOS. Technical Digest-International Electron Devices Meeting, San Francisco, 8-11 December 2002, 625-628.
https://doi.org/10.1109/IEDM.2002.1175917
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