Guo et al. K. (2019) Effects of Ion Beam Etching of Fused Silica Substrates on the Laser-Induced Damage Properties of Antireflection Coatings at 355 nm. Opt Mater, 90, 172-179. https://doi.org/10.1016/j.optmat.2019.02.034

has been cited by the following article:

• TITLE: Study on Preparation and Ns-Laser Damage of HfO2 Single Layers

  AUTHORS: Kesheng Guo, Lang Hu, Hong Wei, Qiang Hu, Hongbo He, Ping Xu

  KEYWORDS: HfO2 Single Layers, Argon Flux, Laser Damage, Optical Coatings

  JOURNAL NAME: Optics and Photonics Journal, Vol.11 No.8, August 3, 2021

  ABSTRACT: The effects of the main parameters of argon flux, oxygen flux and beam voltage on the surface morphology, transmittance spectrum and laser damage of the HfO2 single layers prepared by ion beam sputtering are studied. The HfO2 amorphous single layers have porous surface morphologies. Different processes will cause differences in coatings absorption and surface morphology, which in turn will cause changes in the spectral transmittance curve. The ion beam sputtering HfO2 single layers have high content of argon (4.5% - 8%). The laser damage of HfO2 single layers is related to argon inclusions and non-stoichiometric defects. The changes of argon flux and beam voltage have a greater impact on argon content and O/Hf ratio. When the argon content in the coatings is lower and the O/Hf ratio is higher, the laser damage thresholds of the HfO2 single layers are higher.