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Li, Y., Ma, Y., Lin, W., Dong, P., Yang, Z.M., Gong, M., Bi, J.S., Li, B., Xi, K. and Xu, G.B. (2018) Study of γ-Ray Irradiation Influence on TiN/HfO2/Si MOS Capacitor by C-V and DLTS. Superlattices and Microstructures, 120, 313-318.
https://doi.org/10.1016/j.spmi.2018.05.046

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