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https://doi.org/10.1016/S1386-1425(02)00037-9

has been cited by the following article:

• TITLE: Impact Thickness on Structural and Electrical Characterization of Nickel Phthalocyanine Thin Films

  AUTHORS: Eman M. Nasir, Mohammed T. Hussein, Addnan H. Al-Aarajiy

  KEYWORDS: Nickel Phthalocyanine, Vacuum Evaporation, XRD, AFM, Morphology, Thin Film, Electrical Properties

  JOURNAL NAME: Advances in Materials Physics and Chemistry, Vol.9 No.7, July 31, 2019

  ABSTRACT: Thin films of Nickel Phthalocyanine have been prepared by evaporation technique for (50 - 350 nm) of thickness. XRD studies show that the thin films have single crystalline structure for low thicknesses with (100) orientation and the crystallite size increased with increased thickness. Also from the AFM technique for NiPc films, the roughness was determined and the grain size increases with increasing of thickness from except at thickness 350 nm. The studies of electrical properties, morphology and orientations of the crystallites are important to understand and predict the nature of the films and essential for their successful applications in solar cell and sensors. The electrical properties of these films were studied with different thickness, NiPc has three activation energy. Carrier’s concentration and mobility was calculated. Hall measurements showed that all the films are p-type.