TITLE:
Nanostructure of Rutile TiO2 Thin Films Prepared on Unheated Substrate by Dual Cathode DC Unbalanced Magnetron Sputtering
AUTHORS:
Wichai Kongsri, Supanee Limsuwan, Surasing Chaiyakun, Pichet Limsuwan, Chittra Kedkaew
KEYWORDS:
TiO2, Magnetron Sputtering, Rutile
JOURNAL NAME:
Materials Sciences and Applications,
Vol.10 No.3,
March
25,
2019
ABSTRACT: In this
work, structural and optical properties of the TiO2 films deposited
on unheated substrates by dual cathode dc unbalanced magnetron sputtering at
long substrate-target distance (ds-t) were studied. Titanium dioxide
(TiO2) thin films were deposited on unheated Si (110) wafers, glass
slides and carbon coated copper grids at different substrate to target (ds-t)
distances. The structural properties of TiO2 thin films were
characterized by X-ray diffraction (XRD) and transmission electron microcopy
(TEM) with selected-area electron diffraction (SAED), surface morphology using
atomic force microscopy (AFM) and optical transmission spectra using a
spectrophotometer. XRD results show that TiO2 films deposited at
various ds-t distances have only rutile crystal structure. The
crystallinity and thickness of the films increased while the roughness
decreased with decreasing ds-t distance. The refractive indices of
the deposited films were found to be in the range of 2.51 - 2.82
and increased with decreasing ds-t distance.