J. J. McClelland, R. Gupta, R. J. Celotta and G. A. Porkolab, “Nanostructure Fabrication by Reactive-Ion Etching of Laser-Focused Chromium on Silicon,” Applied Physics B, Vol. 66, No. 1, 1998, pp. 95-98. doi:10.1007/s003400050361

has been cited by the following article:

• TITLE: Analysis of Cr Atoms Three-Dimensional Deposition Characteristics

  AUTHORS: Hua-Lei Yang, Wen-Tao Zhang, Jian Yang

  KEYWORDS: Three-Dimensional Analysis, Atom Deposition, Cr Atoms, Gaussian Laser Standing Wave Field

  JOURNAL NAME: World Journal of Nano Science and Engineering, Vol.1 No.3, September 29, 2011

  ABSTRACT: The semi-classical model is used to simulate the three-dimensional trajectory and deposition distribution of the chromium atoms in the Gaussian laser standing wave field using the Runge-Kutta method, and then the three-dimensional deposition stripes are also given, besides, the effects of atomic beam divergence, chromatic aberration and spherical aberration on deposition structure are also analyzed.