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Kakiuchi, H., Nakahama, Y., Ohmi, H., Yasutake, K., Yoshii, K. and Mori Y. (2005) Investigation of Deposition Characteristics and Properties of High-rate Deposited Silicon Nitride Films Prepared by Atmospheric Pressure Plasma Chemical Vapor Deposition. Thin Solid Films, 479, 17-23.
http://dx.doi.org/10.1016/j.tsf.2004.11.104

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