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Takagi, T., Takechi, K., Nakagawa, Y., Watabe, Y. and Nishida, S. (1998) High Rate Deposition of a-Si:H and a-SiNx:H by VHF PECVD. Vacuum, 51, 751-755.
http://dx.doi.org/10.1016/S0042-207X(98)00284-X

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