Article citationsMore>>

Takagi, T., Takechi, K., Nakagawa, Y., Watabe, Y. and Nishida, S. (1998) High Rate Deposition of a-Si:H and a-SiNx:H by VHF PECVD. Vacuum, 51, 751-755.

has been cited by the following article:

Follow SCIRP
Twitter Facebook Linkedin Weibo
Contact us
WhatsApp +86 18163351462(WhatsApp)
Click here to send a message to me 1655362766
Paper Publishing WeChat
Free SCIRP Newsletters
Copyright © 2006-2022 Scientific Research Publishing Inc. All Rights Reserved.