TITLE:
Slim Water Injection Nozzle for Silicon Wafer Wet Cleaning Bath
AUTHORS:
Shogo Okuyama, Kento Miyazaki, Nobutaka Ono, Hitoshi Habuka, Akihiro Goto
KEYWORDS:
Silicon Wafer, Wet Cleaning Bath, Water Injection Nozzle, Water Flow
JOURNAL NAME:
Advances in Chemical Engineering and Science,
Vol.6 No.4,
September
12,
2016
ABSTRACT: In order to effectively and quickly clean the surface of semiconductor silicon wafers, the fluid flow is one of the significant issues. For a batch-type silicon wafer wet cleaning bath, a slim water injection nozzle consisting of a dual tube was studied, based on theoretical calculations and experiments. A thin inner tube was placed at the optimum position in the water injection nozzle. Such a simple design could make the water injection direction normal and the water velocity profile symmetrical along the nozzle. The water flow in the wet cleaning bath was observed using a blue-colored ink tracer. When the nozzle developed in this study was placed at the bottom of the bath, a fast and symmetrical upward water stream was formed between and around the wafers.