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Chen, C.-W., Chien, C.-H., Perng, T.-H., Yang, M.-J., Liang, J.-S., Lehnen, P., Tsui, B.-Y. and Chang, C.-Y. (2005) Electrical Characteristics of Thin HfO2 Gate Dielectrics Prepared Using Different Pre-Deposition Surface Treatments. Japanese Journal of Applied Physics, 44, 87-93.
http://dx.doi.org/10.1143/JJAP.44.87

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