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Elfving, A., Zhao, M., Hansson, G.V. and Ni, W.-X. (2006) Asymmetric Relaxation of SiGe/Si(110) Investigated by High-Resolution X-Ray Diffraction Reciprocal Space Mapping. Applied Physics Letters, 89, Article ID: 181901.
http://dx.doi.org/10.1063/1.2364861
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