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Lemberger, M., Thiemann, S., Baunemann, A., Parala, H., Fischer, R.A., Hinz, J., Bauer, A.J. and Ryssel, H. (2007) MOCVD of Tantalum Nitride Thin Films from TBTEMT Single Source Precursor as Metal Electrodes in CMOS Applications. Surface and Coatings Technology, 201, 9154-9158. http://dx.doi.org/10.1016/j.surfcoat.2007.04.074
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