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K. Flachbart, V. Pavlнk, N. Toma?ovi?ová, C. J. Adkins, M. So-mora, J. Leib and G. Eska, “Conduction Mechanism in RuO2-Based Thick Films,” Physica Status Solidi (B), 205, No. 1, January 1998, pp. 399-404. doi:10.1002/(SICI)1521-3951(199801)205:1<399::AID-PSSB399>3.0.CO;2-X

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