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Steingötter, I. and Fouckhardt, H. (2005) Deep Fused Silica Wet Etching Using an Au-Free and Stress Reduced Sputter Deposited Cr Hard Mask. Journal of Micromechanics and Microengeering, 15, 2130-2135.
http://dx.doi.org/10.1088/0960-1317/15/11/019

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