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L. Brissonneau and C. Vahlas, “Precursors and Operating Conditions for the Metal-Organic Chemical Vapor Deposition of Nickel Films,” Annales de Chimie-Science des Materiaux, Vol. 25, No. 2, 2000, pp. 81-90. doi:10.1016/S0151-9107(00)88716-4

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