C. A. Tseng, J. C. Lin, Y. F. Chang, S. D. Chyou and K. C. Peng, “Microstructure and Characterization of AlDoped ZnO Films Prepared by RF Power Sputtering on Al and ZnO Targets,” Applied Surface Science, Vol. 258, No. 16, 2012, pp. 5996-6002.
http://dx.doi.org/10.1016/j.apsusc.2012.02.061

has been cited by the following article:

• TITLE: Al-Doping Effect on the Surface Morphology of ZnO Films Grown by Reactive RF Magnetron Sputtering

  AUTHORS: Erica Pereira da Silva, Michel Chaves, Gilvan Junior da Silva, Larissa Baldo de Arruda, Paulo Noronha Lisboa-Filho, Steven Frederick Durrant, José Roberto Ribeiro Bortoleto

  KEYWORDS: ZnO Thin Films; Surface Morphology; RF Magnetron Sputtering

  JOURNAL NAME: Materials Sciences and Applications, Vol.4 No.12, December 6, 2013

  ABSTRACT: Zinc oxide (ZnO) and aluminum-doped zinc oxide (ZnO:Al) thin films were deposited onto glass and silicon substrates by RF magnetron sputtering using a zinc-aluminum target. Both films were deposited at a growth rate of 12.5 nm/min to a thickness of around 750 nm. In the visible region, the films exhibit optical transmittances which are greater than 80%. The optical energy gap of ZnO films increased from 3.28 eV to 3.36 eV upon doping with Al. This increase is related to the increase in carrier density from 5.9 × 1018 cm-3 to 2.6 × 1019 cm-3. The RMS surface roughness of ZnO films grown on glass increased from 14 to 28 nm even with only 0.9% at Al content. XRD analysis revealed that the ZnO films are polycrystalline with preferential growth parallel to the (002) plane, which corresponds to the wurtzite structure of ZnO.