[1]
|
K. Luo, Y. Q. Fu, H. R. Le, J. A. Williams, S. M. Spear-ing and W. I. Milne “Diamonde and Diamonde-Like Carbon MEMS,” Journal of Micromechanics and Mi-croengineering, Vol. 17, No. 1, June 2007, pp. S147-S163.
doi:10.1088/0960-1317/17/7/S12
|
[2]
|
A. Tibrewala, E. Peiner, R. Bandorf, S. Biehl and H. Lüthje, “The Piezoresistive Effect in Diamonde-Like Carbon Films,” Journal of Micromechanics and Micro-engineering, Vol. 17, No. 7, June 2007, pp. S77-S82.
doi:10.1088/0960-1317/17/7/S03
|
[3]
|
R. Hauert, “Tribology of Diamond-Like Carbon Films: Fundamentals and Applications,” Springer, New York, 2008.
|
[4]
|
S. Tinchev, P. Nikolova, S. Balabanov and N. Georgiev, “Amorphous Hydrogenated Carbon Coating for Thermal Solar Collectors,” Journal of Physics: Conference Sries, Vol. 113, 2008, p. 1.
|
[5]
|
E. Peiner, A. Tibrewala, R. Bandorf, H. Lüthje, L. Doering and W. Limmer, “Diamond-Like Carbon for MEMS,” Journal of Micromechanics and Microengineering, Vol. 17, No. 7, June 2007, pp. S83-S90.
doi:10.1088/0960-1317/17/7/S04
|
[6]
|
W. I. Milne, “Electronic Device from Diamonde-Like Carbon,” Semiconductor Science and Technology, Vol. 18, February 2003, pp. S81-S85.
doi:10.1088/0268-1242/18/3/312
|
[7]
|
E. Neyts, A. Bogaerts and M. C. M. van de Sanden, “Reaction Mechanisms and Thin a-C:H Film Growth from Low Energy Hydrocarbon Radicals,” Journal of Physics: Conference Series, Vol. 86, No. 1, 2007, pp. 1-15.
|
[8]
|
P. Wang, X. Wang, W. M. Liu and J. Y. Zhang, “Growth and Structure of Hydrogenated Carbon Films Containing Fullerene-Like Structure,” Journal of Physics D: Applied Physics, Vol. 41, No. 8, March 2008, pp. 1-7.
doi:10.1088/0022-3727/41/8/085401
|
[9]
|
G. Romyani, J. Tapati and R. Swati, “Transparent Polymer and Diamond-Like Hydrogenated Amorphous Carbon Thinfilms by PECVD Technique,” Journal of Physics D: Applied Physics, Vol. 41, No. 15, July 2008, pp. 1-7.
|
[10]
|
F. Zhao, H. X. Li, L. Ji, Y. F. Mo, W. L. Quan, H. D. Zhou and J. M. Chen, “Structural, Mechanical and Tri-bological Characterizations of a-C:H:Si Films Prepared by Hybrid PECVD and Sputtering Technique,” Journal of Physics D: Applied Physics, Vol. 42, No. 16, July 2009, pp. 1-13. doi:10.1088/0022-3727/42/16/165407
|
[11]
|
N. M. S. Marins, R. P. Mota, D. C. R. Santos, R. Y. Honda, M. E. Kayama, K. G. Kostov, M. A. Algatti, N. C. Cruz and E. C Rangel, “Amorphous Hydrogenated Carbon Films Treated by SF6 Plasma,” Journal of Physics: Conference Series, Vol. 167, No. 1, 2009, pp. 1-4.
|
[12]
|
L. Gabriel, “Influence of the Substrate-Electrode Applied Bias Voltage on the Properties of Sputtered a-C:H Thin Films,” Journal of Physics: Condensed Matter, Vol. 13, No. 13, 2001, pp. 3011-3021.
doi:10.1088/0953-8984/13/13/314
|
[13]
|
H. águas, R. Martins and E. Fortunato, “Plasma Dianos-tics of a PECVD System Using Different R.F. Elec Trode Configurations,” Vacuum, Vol. 56, No. 1, January 2000, pp. 31- 37.
|
[14]
|
K. Sommeri, A. P. Thorne and R. C. M. Learner, “An Active Filter for Inert Gas Lines in a Hollow Cathode Light Source,” Journal of Physics D: Applied Physics, Vol. 16, No. 3, 1983, pp. 233-244.
doi:10.1088/0022-3727/16/3/006
|
[15]
|
D. Mihailova, J. van Dijk, M. Grozeva, G. J. M. Hagelaar and J. J. A. M. van der Mullen, “A Hollow Cathode Dis-charge for Laser Applications: Influence of the Cathode Length,” Journal of Physics D: Applied Physics, Vol. 43, No. 14, March 2010, pp. 1-9.
doi:10.1088/0022-3727/43/14/145203
|
[16]
|
A. Von Engel, “Ionized Gases,” Clarendon, Oxford, 1955.
|
[17]
|
K. Yambe, “Property of Plasma by Radio Frequency Discharge with the Us of Multi Hollow Cathods,” Journal of Physics: Conference Series, Vol. 106, 2008, pp. 1-5.
|
[18]
|
Y. Ohtsu and H. Fujita, “Production of High-Density Capacitive Plasma by the Effect of Multihollow Cathode Discharge and High-Secondary-Electron Emission,” Ap-plied Physics Letters, Vol. 92, No. 17, April 2008, pp. 1-3.
|
[19]
|
A. Pastol and Y. Catherine, “Optical Emission Spectros-copy for Diagnostic and Monitoring of CH4 Plasmas Used for a-C:H Deposition,” Journal of Physics D: Ap-plied Physics, Vol. 23, No. 7, 1990, pp. 799-805.
doi:10.1088/0022-3727/23/7/008
|
[20]
|
Y. Catherine and P. Couderc, “Electrical Characteristics and Growth Kinetics in Discharges Used for Plasma Depo Sition of Amorphous Carbon,” Thin Solid Films, Vol. 144, No. 2, 1986, pp. 265-280.
doi:10.1016/0040-6090(86)90419-0
|
[21]
|
C. Riccardi, R. Barni, M. Fontanesi, B. Marcandalli, M. Massafra, E. Selli and G. Mazzone, “A SF6 RF Plasma Reactor for Research on Textile Treatment,” Plasma Sources Science and Technology, Vol. 10, No. 1, 2001, pp. 92-98. doi:10.1088/0963-0252/10/1/312
|
[22]
|
S. Peter, K. Graupner, D. Grambole and F. Richter, “Comparative Experimental Analysis of the a-C:H Depo-sition Processes Using CH4 and C2H2 as Precursors,” Journal of Applied Physics, Vol. 102, No. 5, 2007, pp. 1-18. doi:10.1063/1.2777643
|
[23]
|
E. Oks, “Plasma Cathode Electron Sources: Physics, Technology, Applications,” Wiley-Vch Verlag GmbH & Co.KGaA, Weinheim, 2006.
|
[24]
|
H. Barankova, “Proc. Inte.r Sym. on Thin Film Materials, Processes, Reliability, and Applications: Thin Film Processes,” Electrochemical Society Inc, Pennington, 1998.
|