Determination of N and O-Atoms, of N2(A) and N2(X, v > 13) Metastable Molecules and N2+ Ion Densities in the Afterglows of Ar-N2 Microwave Discharges

Abstract

Early afterglows of Ar-N2 flowing microwave discharges are characterized by optical emission spectroscopy. The N and O atoms, the N2(A) and N2(X, v > 13) metastable molecules and N2+ ion densities are determined by optical emission spectroscopy after calibration by NO titration for N and O-atoms and measurements of NO and N2 band intensities. For an Ar-xN2 gas mixture with × increasing from 2 to 100% at 4 Torr, 100 Watt and an afterglow time of 3 × 10- 3 s at the 5 liter reactor inlet, it is found densities in the ranges of (2 - 6) × 1014 cm- 3 for N-atoms, one order of magnitude lower for N2(X, v > 13) and for O-atoms (coming from air impurity), of 1010 - 1011 cm- 3 for N2(A) and of 108 - 109 cm- 3 for N2+.

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+ Ion Densities in the Afterglows of Ar-N2 Microwave Discharges">
Ricard, A. , Zerrouki, H. and Sarrette, J. (2015) Determination of N and O-Atoms, of N2(A) and N2(X, v > 13) Metastable Molecules and N2+ Ion Densities in the Afterglows of Ar-N2 Microwave Discharges. Journal of Analytical Sciences, Methods and Instrumentation, 5, 59-65. doi: 10.4236/jasmi.2015.54007.

Conflicts of Interest

The authors declare no conflicts of interest.

References

[1] Villeger, S., Sarrette, J.P. and Ricard, A. (2005) Synergy between N and O Atom Action and Substrate Temperature in a Sterilization Process Using a Flowing N2-O2 Microwave Post-Discharge. Plasma Process and Polymers, 2, 709-711.
http://dx.doi.org/10.1002/ppap.200500040
[2] Villeger, S., Sarrette, J.P., Rouffet, B., Cousty, S. and Ricard, A. (2008) Treatment of Flat and Hollow Substrates by a Pure Nitrogen Flowing Post Discharge. Application to Bacterial Decontamination in Low Diameter Tubes. European Physical Journal Applied Physics, 42, 25-32.
http://dx.doi.org/10.1051/epjap:2007177
[3] Ricard, A., Gaboriau, F. and Canal, C. (2008) Optical Spectroscopy to Control a Plasma Reactor for Surface Treatments. Surface and Coatings Technology, 202, 5220-5224.
http://dx.doi.org/10.1016/j.surfcoat.2008.06.070
[4] Ricard, A., Oh, S.G. and Guerra,V. (2013) Line-Ratio Determination of Atomic Oxygen and N2 Metastable Absolute Densities in an RF Nitrogen Late Afterglow. Plasma Sources Science and Technology, 22, Article ID: 035009. http://dx.doi.org/10.1088/0963-0252/22/3/035009
[5] Ricard, A. and Oh, S.G. (2014) Densities of Active Species in N2 and N2-H2 RF Pink Afterglow. Plasma Sources Science and Technology, 23, Article ID: 045009.
http://dx.doi.org/10.1088/0963-0252/23/4/045009
[6] Zerrouki, H., Ricard, A. and Sarrette, J.P. (2014) Determination of N and O-Atoms, of N2(A) and N2(X, v>13) Metastable Molecules and N2+ Ion Densities in the Afterglows of N2-H2, Ar-N2-H2 and Ar-N2-O2 Microwave Discharges. Journal of Physics: Conference Series, 550, Article ID: 012045.
http://dx.doi.org/10.1088/1742-6596/550/1/012045
[7] Levaton, J. and Amorim, J. (2012) Metastable Atomic Species in the N2 Flowing Afterglow. Chemical Physics, 397, 9-17.
http://dx.doi.org/10.1016/j.chemphys.2011.11.010
[8] Sa, P.A., Guerra, V., Loureiro, J. and Sadeghi, N. (2004) Self-Consistent Kinetic Model of the Short Lived Afterglow in Flowing Nitrogen. Journal of Physics D: Applied Physics, 37, 221-231.
http://dx.doi.org/10.1088/0022-3727/37/2/010
[9] Piper, L.G. (1994) Further Observations on the Nitrogen Orange Afterglow. Journal of Chemical Physics, 101, 10229- 10236. http://dx.doi.org/10.1063/1.467903
[10] Kang, N., Lee, M., Ricard, A. and Oh, S.G. (2012) Effect of Controlled O2 Impurities on N2 Afterglows of RF Discharges. Current Applied Physics, 12, 1448-1453.
http://dx.doi.org/10.1016/j.cap.2012.04.009
[11] Sadeghi, N., Foissac, C. and Supiot, P. (2001) Kinetics of N2(A) Molecules and Ionization Mechanisms in the Afterglow of a Flowing N2 Microwave Discharge. Journal of Physics D: Applied Physics, 34, 1779-1788. http://dx.doi.org/10.1088/0022-3727/34/12/304
[12] Ferreira, J.A., Stafford, L., Leonelli, R. and Ricard, A. (2014) Electrical Characterization of the Flowing Afterglow of N2 and N2/O2 Microwave Plasmas at Reduced Pressure. Journal of Applied Physics, 115, Article ID: 163303.
[13] Fehsenfeld, F.C., Ferguson, E.E. and Schmeltekopf, A.J. (1966) Thermal Energy Ion-Neutral Reactions Rates VI. Some Ar+ Charge Transfer Reactions. Journal of Chemical Physics, 45, 404-405.
http://dx.doi.org/10.1063/1.1727351

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