function () { return new ActiveXObject('MSXML2.XMLHttp.3.0'); }, function () { return new XMLHttpRequest(); }, function () { return new ActiveXObject('MSXML2.XMLHttp.5.0'); }, function () { return new ActiveXObject('MSXML2.XMLHttp.4.0'); }, function () { return new ActiveXObject('Msxml2.XMLHTTP'); }, function () { return new ActiveXObject('MSXML.XMLHttp'); }, function () { return new ActiveXObject('Microsoft.XMLHTTP'); } ) || null; }, post: function (sUrl, sArgs, bAsync, fCallBack, errmsg) { var xhr2 = this.init(); xhr2.onreadystatechange = function () { if (xhr2.readyState == 4) { if (xhr2.responseText) { if (fCallBack.constructor == Function) { fCallBack(xhr2); } } else { //alert(errmsg); } } }; xhr2.open('POST', encodeURI(sUrl), bAsync); xhr2.setRequestHeader('Content-Length', sArgs.length); xhr2.setRequestHeader('Content-Type', 'application/x-www-form-urlencoded'); xhr2.send(sArgs); }, get: function (sUrl, bAsync, fCallBack, errmsg) { var xhr2 = this.init(); xhr2.onreadystatechange = function () { if (xhr2.readyState == 4) { if (xhr2.responseText) { if (fCallBack.constructor == Function) { fCallBack(xhr2); } } else { alert(errmsg); } } }; xhr2.open('GET', encodeURI(sUrl), bAsync); xhr2.send('Null'); } } function SetSearchLink(item) { var url = "../journal/recordsearchinformation.aspx"; var skid = $(":hidden[id$=HiddenField_SKID]").val(); var args = "skid=" + skid; url = url + "?" + args + "&urllink=" + item; window.setTimeout("showSearchUrl('" + url + "')", 300); } function showSearchUrl(url) { var callback2 = function (xhr2) { } ajax2.get(url, true, callback2, "try"); }
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High Density Fluorine Negative-Ion Source Generated by Utilizing Magnetized SF6

Abstract Full-Text HTML XML Download Download as PDF (Size:520KB) PP. 89-91
DOI: 10.4236/jmp.2014.52014    2,891 Downloads   4,079 Views  
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M. Abid Imtiaz, Tetsu Mieno

Affiliation(s)

Department of Physics, Faculty of Science, Shizuoka University, Shizuoka-shi, Japan.

ABSTRACT

In a magnetized plasma column generated from an electronegative gas, negative-ions accumulate around the plasma column via radial diffusion. In this study, a dc discharge is applied in SF6 gas to produce a plasma column, and the radial density profile of negative-ions is measured by Langmuir probes using the modified Bohm criterion. The gas pressure and discharge current dependences of negative-ion density are also measured. It is found that the negative-ion density of 8.0 × 1017 m-3 is obtained around the plasma column at r = 1.0 cm when SF6 pressure is 0.13 Pa and discharge current is 0.50 A. The negative-ion density has radial gradient, and the electron density is much lower in this region.

KEYWORDS

Fluorine Negative-Ion; Ion Source; String-Type Plasma; Radial Diffusion; Langmuir Probe; Magnetized Plasma; Sulfur Hexafluoride

Cite this paper

M. Imtiaz and T. Mieno, "High Density Fluorine Negative-Ion Source Generated by Utilizing Magnetized SF6," Journal of Modern Physics, Vol. 5 No. 2, 2014, pp. 89-91. doi: 10.4236/jmp.2014.52014.

Conflicts of Interest

The authors declare no conflicts of interest.

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