Model for a UV Laser Based Local Polymer Surface Halogenation Process Using a Gaseous Precursor

Simon Kibben

BIAS—Bremer Institut für Angewandte Strahltechnik GmbH, Bremen, Germany.

DOI: 10.4236/mnsms.2014.41003                

Abstract

An analytical model describing the physical relations of a UV-based process for halogenation of polymeric surfaces is presented. The process allows, depending on the parameters, a local halogenation with sharp edges at the interfaces to areas where no halogenation is desired. This is achieved via a nonreactive halogen-containing gaseous precursor and a UV source providing photons which dissociate the precursor photolytically. Thus, only where the UV photons affect the precursor, halogens are generated and the polymer is being halogenated.

Keywords

Local Surface Halogenation; Polymer Modification; UV-Laser-Based Surface Modification

Conflicts of Interest

The authors declare no conflicts of interest.

References

[1]	L. J. Hayes and D. D. Dixon, “Surface Tension versus Barrier Property for Fluorinated Surfaces,” Journal of Applied Polymer Science, Vol. 22, No. 4, 1978, pp. 1007 1013. http://dx.doi.org/10.1002/app.1978.070220411
[2]	E. Liston, L. Martinu and M. Wertheimer, “Plasma Surface Modification of Polymers for Improved Adhesion: A Critical Review,” Journal of Adhesion Science and Technology, Vol. 7, No. 10, 1993, pp. 1091 1127. http://dx.doi.org/10.1163/156856193X00600
[3]	R. Jourdain, M. Castelli, P. Shore, P. Sommer and D. Proscia, “Reactive Atom Plasma (RAP) Figuring Machine for Meter Class Optical Surfaces,” Production Engineering, Vol. 7, No. 6, 2013, pp. 665-673. http://dx.doi.org/10.1007/s11740-013-0467-1
[4]	T. Ikegame and M. Murahara, “ArF Excimer Laser and Xe2* Excimer Lamp Induced Photochemical Fluorination of Polyimide Film,” MRS Proceedings, Vol. 544, No. 1, 1998, pp. 227 232. http://dx.doi.org/10.1557/PROC-544-227
[5]	K. Tanizawa and M. Murahara, “Laser-Induced Photochemical Surface Modification of Intraocular Lens for Blocking After-Cataract,” MRS Proceedings, Vol. 735, No. 1, 2002, pp. 117 122.
[6]	C. Wochnowski, M. D. Ferdinando, C. Giolli, F. Vollertsen and U. Bardi, “UV-Laser-Assisted Liquid Phase Fluorination of PMMA,” Applied Surface Science, Vol. 253, No. 24, 2007, pp. 9435 9442. http://dx.doi.org/10.1016/j.apsusc.2007.06.017
[7]	J. Ackerhalt and J. Eberly, “Coherence versus Incoherence in Stepwise Laser Excitation of Atoms and Molecules,” Physical Review A, Vol. 14, No. 5, 1976, pp. 1705 1710. http://dx.doi.org/10.1103/PhysRevA.14.1705
[8]	W. K. Bischel, L. J. Jusinski, M. N. Spencer and D. J. Eckstrom, “Absolute Two-Photon Ionization Yields for Selected Organic Molecules at 248 nm,” Journal of the Optical Society of America B, Vol. 2, No. 6, 1985, pp. 877 885. http://dx.doi.org/10.1364/JOSAB.2.000877
[9]	J. P. Reilly and K. L. Kompa, “Laser Induced Multiphoton Ionization Mass Spectrum of Benzene,” The Journal of Chemical Physics, Vol. 73, No. 11, 1980, pp. 5468 5476. http://dx.doi.org/10.1063/1.440092
[10]	M. Rossi and D. J. Eckstrom, “Quantitative Aspects of Benzene Photoionization at 248 nm,” Chemical Physics Letters, Vol. 120, No. 2, 1985, pp. 118 123. http://dx.doi.org/10.1016/0009-2614(85)87025-1
[11]	D. S. Zakheim and P. M. Johnson, “Rate Equation Modelling of Molecular Multiphoton Ionization Dynamics,” Chemical Physics, Vol. 46, No. 3, 1980, pp. 263 272. http://dx.doi.org/10.1016/0301-0104(80)85202-5