A Supersonic Plasma Jet Source for Controlled and Efficient Thin Film Deposition

Ilaria Biganzoli, Francesco Fumagalli, Fabio Di Fonzo, Ruggero Barni, Claudia Riccardi

Center for Nano Science and Technology, Italian Institute of Technology, Milano, Italy.
Dipartimento di Fisica Occhialini, Università degli Studi di Milano-Bicocca, Milano, Italy.

DOI: 10.4236/jmp.2012.330200                

Abstract

A novel plasma source suitable for controllable nanostructured thin film deposition processes is proposed. It exploits the separation of the process in two distinct phases. First precursor dissociation and radical formation is performed in a dense oxidizing plasma. Then nucleation and aggregation of molecular clusters occur during the expansion into vacuum of a supersonic jet. This allows a superior control of cluster size and energy in the process of film growth. Characterization of the plasma state and source performances in precursor dissociation have been investigated. The performances of this new Plasma Assisted Supersonic Jet Deposition technique were demonstrated using organic compounds of titanium to obtain TiO₂ thin nanostructured films.

Keywords

Plasma Sources; ICP Discharges; PECVD; Plasma Diagnostics; Titanium Dioxide; Thin Film Deposition

Conflicts of Interest

The authors declare no conflicts of interest.

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