Growth and Electrical Properties of Doped ZnO by Electrochemical Deposition
Dewei Chu, Sean Li
DOI: 10.4236/njgc.2012.21003   PDF   HTML   XML   6,790 Downloads   12,492 Views   Citations


In this work, pure and different metal ions doped ZnO thin films were obtained by a facile electrochemical deposition process. Different morphologies of ZnO, such as nanoplates, nanoparticles, as well as dense film can be obtained by doping Cu2+, In3+, and Al3+, respectively. Besides, the electrical properties of ZnO were also dependent on the doping ions. In this work, only pure ZnO shows resistive switching characteristics, indicating that the defects in ZnO is a key role in inducing resistive switching behaviour.

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D. Chu and S. Li, "Growth and Electrical Properties of Doped ZnO by Electrochemical Deposition," New Journal of Glass and Ceramics, Vol. 2 No. 1, 2012, pp. 13-16. doi: 10.4236/njgc.2012.21003.

Conflicts of Interest

The authors declare no conflicts of interest.


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