Open Journal of Organic Polymer Materials

Volume 5, Issue 2 (April 2015)

ISSN Print: 2164-5736   ISSN Online: 2164-5752

Google-based Impact Factor: 2.44  Citations  

Morphology Control of Polymer Microspheres Containing Block Copolymers with Seed Polymerization

HTML  XML Download Download as PDF (Size: 2702KB)  PP. 43-50  
DOI: 10.4236/ojopm.2015.52005    5,174 Downloads   6,154 Views  Citations

ABSTRACT

Microspheres based on binary polymer blend consisting of polystyrene (PSt), poly (methyl methacrylate) (PMMA), block copolymer comprising PSt and PMMA subunits, and ternary polymer blend consisting of PSt, PMMA, and block copolymer were fabricated by a solvent evaporation method, in which a polymer solution in dichloromethane was dispersed in water phase with the aid of a homogenizer to obtain an O/W emulsion followed by solvent evaporation with agitation to solidify the polymer. In the case of ternary blend, the effect of block copolymer content on the morphology of resulting spheres was investigated. Ternary blends afforded the bi-compartmental morphologies, the intermediate morphology between Janus and core-shell, which was confirmed by TEM observation. Seed polymerization of St or MMA was also carried out utilizing the resulting microspheres as seed particles in order to control the shape, and the surface morphology of particles. The particles with snowman-like morphology were obtained by seed polymerization of St using PSt/PMMA binary blend microspheres as seed particles. Surface roughness was controlled by the polymerization of MMA in the block copolymer seed, and that of St in the ternary blend seed.

Share and Cite:

Taherzadeh, H. , Sotowa, S. and Ogino, K. (2015) Morphology Control of Polymer Microspheres Containing Block Copolymers with Seed Polymerization. Open Journal of Organic Polymer Materials, 5, 43-50. doi: 10.4236/ojopm.2015.52005.

Copyright © 2024 by authors and Scientific Research Publishing Inc.

Creative Commons License

This work and the related PDF file are licensed under a Creative Commons Attribution 4.0 International License.