Extendibility Evaluation of Industrial EUV Source Technologies for kW Average Power and 6.x nm Wavelength Operation

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Journal of Modern Physics

ISSN Print: 2153-1196
ISSN Online: 2153-120X
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"Extendibility Evaluation of Industrial EUV Source Technologies for kW Average Power and 6.x nm Wavelength Operation"
written by Akira Endo,
published by Journal of Modern Physics, Vol.5 No.5, 2014

has been cited by the following article(s):

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CrossRef

[1]	6. X nm 下一代极紫外多层膜技术研究进展
	Chinese Journal of Lasers, 2024

[2]	Suppression of Surface Crystallization in Amorphous Tio2 Protective Film on Collector Mirror for Lifetime Elongation of Extreme Ultraviolet Light Source
	SSRN Electronic Journal, 2022

[3]	Studie vývoje kompaktního laserového zesilovače s opakovací frekvencí v řádu kilohertz a energií pulsu jednotek joule pracujícího za pokojové teploty
	2021

[4]	EUV Sources
	Handbook of Laser Micro …, 2020

[5]	Surface morphology change of protective film on collector mirror related to implantation of Sn emitted from laser produced plasma in EUV light source
	2020

[6]	Laser-Produced Plasma Sources for High-Volume-Manufacturing EUV Lithography
	2019

[7]	Case Studies: Technology Innovations Driven by Moore's Law
	2018

[8]	Extending Moore's law through advanced semiconductor design and processing techniques
	2018

[9]	Photolithography Enhancements
	2018

[10]	Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling
	Advanced Optical Technologies, 2017

[11]	Free-electron laser emission architecture impact on EUV lithography
	2017

[12]	kW-class picosecond thin-disc prepulse laser Perla for efficient EUV generation
	Journal of Micro/Nanolithography, MEMS, and MOEMS, 2017

[13]	Advances in High-Power, Ultrashort Pulse DPSSL Technologies at HiLASE
	Applied Sciences, 2017

[14]	Free-electron laser emission architecture impact on extreme ultraviolet lithography
	Journal of Micro/Nanolithography, MEMS, and MOEMS, 2017

[15]	EUV Free-Electron Laser Requirements for Semiconductor Manufacturing
	Lecture Notes of the Institute for Computer Sciences, Social Informatics and Telecommunications Engineering, 2016

[16]	Theory: electron-induced chemistry
	Materials and Processes for Next Generation Lithography, 2016

[17]	Development and Metrology of Extreme Ultraviolet and soft X-ray Multilayer Mirrors
	2016

[18]	Considerations for a free-electron laser-based extreme-ultraviolet lithography program
	SPIE Advanced Lithography, 2015

[19]	Status and Potential of Laser based EUV Sources
	CLEO: Applications and Technology, 2015

[20]	Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development
	Journal of Physics B: Atomic, Molecular and Optical Physics, 2015

[1]	6.X nm下一代极紫外多层膜技术研究进展 Chinese Journal of Lasers, 2024 DOI:10.3788/CJL231495

[2]	6.X nm下一代极紫外多层膜技术研究进展 Chinese Journal of Lasers, 2024 DOI:10.3788/CJL231495

[3]	Handbook of Laser Micro- and Nano-Engineering 2021 DOI:10.1007/978-3-319-69537-2_54-1

[4]	Handbook of Laser Micro- and Nano-Engineering 2021 DOI:10.1007/978-3-030-63647-0_54

[5]	Surface morphology change of protective film on collector mirror related to implantation of Sn emitted from laser produced plasma in EUV light source Applied Physics Express, 2020 DOI:10.35848/1882-0786/abbea3

[6]	Laser-Produced Plasma Sources for High-Volume-Manufacturing EUV Lithography Synchrotron Radiation News, 2019 DOI:10.1080/08940886.2019.1634430

[7]	X-Ray Lasers 2016 Springer Proceedings in Physics, 2018 DOI:10.1007/978-3-319-73025-7_52

[8]	Free-electron laser emission architecture impact on extreme ultraviolet lithography Journal of Micro/Nanolithography, MEMS, and MOEMS, 2017 DOI:10.1117/1.JMM.16.4.041009

[9]	Advances in High-Power, Ultrashort Pulse DPSSL Technologies at HiLASE Applied Sciences, 2017 DOI:10.3390/app7101016

[10]	Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling Advanced Optical Technologies, 2017 DOI:10.1515/aot-2017-0029

[11]	Free-electron laser emission architecture impact on EUV lithography Extreme Ultraviolet (EUV) Lithography VIII, 2017 DOI:10.1117/12.2260452

[12]	Light sources for high-volume manufacturing EUV lithography: technology, performance, and power scaling Advanced Optical Technologies, 2017 DOI:10.1515/aot-2017-0029

[13]	Advances in High-Power, Ultrashort Pulse DPSSL Technologies at HiLASE Applied Sciences, 2017 DOI:10.3390/app7101016

[14]	Considerations for a free-electron laser-based extreme-ultraviolet lithography program Extreme Ultraviolet (EUV) Lithography VI, 2015 DOI:10.1117/12.2085538

[15]	Spectroscopy of highly charged ions and its relevance to EUV and soft x-ray source development Journal of Physics B: Atomic, Molecular and Optical Physics, 2015 DOI:10.1088/0953-4075/48/14/144025

[16]	Status and Potential of Laser based EUV Sources CLEO: 2015, 2015 DOI:10.1364/CLEO_AT.2015.ATu4M.5

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