World Journal of Nano Science and Engineering

World Journal of Nano Science and Engineering

ISSN Print: 2161-4954
ISSN Online: 2161-4962
www.scirp.org/journal/wjnse
E-mail: wjnse@scirp.org
"Design Consideration in the Development of Multi-Fin FETs for RF Applications"
written by Peijie Feng, Prasanta Ghosh,
published by World Journal of Nano Science and Engineering, Vol.2 No.2, 2012
has been cited by the following article(s):
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[6] Design insights into RF/analog and linearity/distortion of spacer engineered multi‐fin SOI FET for terahertz applications
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[8] Optimal Inter-Gate Separation and Overlapped Source of Multi-Channel Line Tunnel FETs
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[9] Design Optimization Techniques in Nanosheet Transistor for RF Applications
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[10] Analysis on DC and RF/Analog Performance in Multifin-FinFET for Wide Variation in Work Function of Metal Gate
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[11] An Improved Analytical Model of Outer Fringe Capacitance of Multifin Diamond Shaped Raised Source/Drain FinFET
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[12] High performance dual-gate SiGe MOSFET for radio-frequency applications
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[13] RF performance enhancement in multi-fin TFETs by scaling inter fin separation
Materials Science in Semiconductor Processing, 2017
[14] Analysis of multifin n-FinFET for analog performance at 30nm gate length
2016
[15] A nanoscale dual-channel trench (DCT) MOSFET for analog/RF applications
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