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Journal of Crystallization Process and Technology
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Journal of Crystallization Process and Technology
ISSN Print:
2161-7678
ISSN Online:
2161-7686
www.scirp.org/journal/jcpt
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jcpt@scirp.org
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"
Analysis of μ-Czochralski Technique Using Two-Dimensional Crystallization Simulator
"
written by
Kuniaki Matsuki, Ryusuke Saito, Shuji Tsukamoto, Mutsumi Kimura, Ryoichi Ishihara
,
published by
Journal of Crystallization Process and Technology
,
Vol.2 No.1, 2012
has been cited by the following article(s):
Google Scholar
CrossRef
[1]
3-D Simulator of Laser Crystallization for Polycrystalline-Silicon Thin-Film Transistors
Semiconductor Manufacturing, IEEE Transactions on 25.4
,
2012
[1]
3-D Simulator of Laser Crystallization for Polycrystalline-Silicon Thin-Film Transistors
IEEE Transactions on Semiconductor Manufacturing
,
2012
DOI:
10.1109/TSM.2012.2205593
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