Open Access Library Journal

Open Access Library Journal

ISSN Print: 2333-9705
ISSN Online: 2333-9721
www.scirp.org/journal/oalibj
E-mail: service@oalib.com
"Characteristics and Operation Conditions of a Closed-Field Unbalanced Dual Magnetrons Plasma Sputtering System"
written by Bahaa T. Chiad, Mohammad K. Khalaf, Firas J. Kadhim, Oday A. Hammadi,
published by Open Access Library Journal, Vol.1 No.4, 2014
has been cited by the following article(s):
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[1] Langmuir Characteristics of Glow Discharge Plasma in DC Reactive Magnetron Sputtering System
IRAQI JOURNAL OF MATERIALS, 2024
[2] Secondary Electron Emission in Glow Discharge Plasmas
IRAQI JOURNAL OF MATERIALS, 2023
[3] Effect of Polyimide Layer on Surface Dielectric Barrier Discharge Characteristics Studied for Air Flow Improvement
Iraqi Journal of Applied Physics, 2023
[4] Optimization of Magnetized Plasma Glow Discharge
probe, 2023
[5] Closed-Field Unbalanced Dual Magnetron Assembly for Plasma Sputtering Systems
Iraqi Journal of Applied Physics …, 2023
[6] Effect of Magnetron Configuration on Plasma Parameters in Sputtering Technique
probe, 2023
[7] Paschen's Curve of Argon Plasma Discharges Employed in Closed-Field Unbalanced Sputtering
Iraqi Journal of Applied Physics Letters, 2023
[8] Analysis of Paschen's Curve of Plasma Sputtering System Employing Closed-Field Unbalanced Dual Magnetron Assembly
Iraqi Journal of Applied Physics Letters, 2023
[9] Breakdown and Langmuir Electrical Characteristics of Glow Discharge Plasma in DC Reactive Dual-Magnetron Sputtering System
2020
[10] Analysis of Secondary Electron Emission in Gas Glow Discharges Used for Thin Film Deposition Processes
2020
[11] Conception of a Tissue Equivalent Plastic Dosimeter Using Scintillating Fibres for Hadronic Therapy and Space Radiation Effects Studies
2019
[12] Measurement of plasma electron temperature and density by using different applied voltages and working pressures in a magnetron sputtering system
2018
[13] 磁控溅射中等离子体电离机制的数值解析
真空科学与技术学报, 2017
[14] 国内外磁控溅射靶材的研究进展
表面技术, 2016
[15] Silicon nitride nanostructures prepared by reactive sputtering using closed-field unbalanced dual magnetrons
Journal of Materials: Design and Applications, 2015
[16] Performance Optimization of Closed-Field Unbalanced Dual Magnetrons DC Plasma Sputtering System
J Indust Eng Sci, 2014
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